MIL-STD-867C
*TABLE IV
Ammonium Peroxydisulfate (Ammonium Persulfate) Swab Etch Technique
STEP |
PROCESS |
SOLUTION |
TIME |
TEMPATURE |
REMARKS |
1. |
Solvent clean |
Acetone (ASTM-0329) or cleaner (A-A-59281) |
As necessary |
Ambient |
Wipe surface with commercial cheese cloth saturated with solvent. Wipe dry with cheese cloth. |
2. |
Etch |
Ammonium Peroxydisulfate 10% by weight in water. |
15 - 60 seconds |
Ambient |
Make solution just before use. Swab with commercial cheese cloth saturated with solution. |
3. |
Rinse |
Clear water |
As required to remove etch solution |
Ambient |
Swab area with commercial cheese cloth saturated with water. |
4. |
Neutralization |
Any alkali solution with a pH of 10 minimum |
As required to neutralize etchant |
Ambient |
Swab area with commercial cheese cloth saturated with alkali solution. |
5. |
Rinse |
Clear water |
As required to remove alkali solution |
Ambient |
Swab with commercial cheese cloth saturated with water. |
6. |
Rinse |
Alcohol or acetone |
To remove water |
Ambient |
Swab with commercial cheese cloth saturated with alcohol. Wipe dry. |
7. |
Inspect and evaluate per appropriate criteria. |
||||
**8. |
Oil |
Rust preventative (MIL-PRF- 16173) |
Swab only |
Ambient |
To prevent corrosion. |
*This process may also be used as an immersion technique, provided pre-cleaning is in accordance with para 5.2. (However see NOTE 2 below.) |
|||||
Steps 1 thru 7 shall be completed without interruption. NOTE 1: No bake required after etching using this process. NOTE 2: Make solution up just before use as it becomes inactive after 72 hours. |
|||||
** This step may be omitted if the facility can show evidence that corrosion during the queue between process steps is not an issue. This could be the case in a low humidity environment. |
9
For Parts Inquires call Parts Hangar, Inc (727) 493-0744
© Copyright 2015 Integrated Publishing, Inc.
A Service Disabled Veteran Owned Small Business